Table of Contents

Polymers in Microlithography: An Overview ; Bronsted Acid Generation from Triphenylsulfonium Salts in Acid-Catalyzed Photoresist Films ; Chemically Amplified Resist: Effect of Polymer and Acid Generator Structure ; Copolymer Approach to Design of Sensitive Deep-UV Resist Systems with High Thermal Stability and Dry Etch Resistance ; Nonswelling Negative Resists Incorporating Chemical Amplification: Electrophilic Aromatic Substitution Approach ; Acid-Catalyzed Cross-Linking in Phenolic-Resin-Based Negative Resists ; New Design for Self-Developing Imaging Systems Based on Thermally Labile Polyformals ; Polysilanes: Solution Photochemistry and Deep-UV Lithography ; Syntheses of Base-Soluble Si Polymers and Their Application to Resists ; Lithographic Evaluation of Phenolic Resin-Dimethyl Soloxane Block Copolymers ; Preparation of a Novel Silicone-Based Positive Photoresist and Its Application to an Image Reversal Process ; Photooxidation of Polymers: Application to Dry-Developed Single-Layer Deep-UV Resists ; Kinetics of Polymer Etching in an Oxygen Glow Discharge ; Quantitative Analysis of a Laser Interferometer Waveform Obtained During Oxygen Reactive-Ion Etching of Thin Polymer Films ; Evaluation of Several Organic Materials as Planarizing Layers for Lithographic and Etchback Processing ; New Negative Deep-UV Resist for KrF Excimer Laser Lithography ; Characterization of a Thiosulfate Funtionalized Polymer: A Water-Soluble Photosensitive Zwitterion ; Pyrimidine Derivatives as Lithographic Materials ; Synthesis of New Metal-Free Diazonium Salts and Their Applications to Microlithography ; Photobleaching Chemistry of Polymers Containing Anthracenes ; Lithography and Spectroscopy of Ultrathin Langmuir-Blodgett Polymer Films ; Dissolution of Phenolic Resins and Their Blends ; Solvent Concentration Profile of Poly(methyl methacrylate) Dissolving in Methyl Ethyl Ketone: A Fluorescence-Quenching Study ; Molecular Studies on Laser Ablation Processes of Polymeric Materials by Time-Resolved Luminescence Spectroscopy ; Mechanism of Polymer Photoablation Explored with a Quartz Crystal Microbalance ; Mechanism of UV- and VUV-Induced Etching of Poly(methyl methacrylate): Evidence for an Energy-Dependent Reaction